Library · Materials, chemistry & fabrication

What Photolithography & Microfabrication got wrong, from 49 theses

Summary written by a model from the records below: Microfabrication and photolithography investigations frequently encounter technical failures in exposure resolution, chemical processing, substrate planarization, and operational throughput. Researchers regularly abandon or reject specialized lithographic and 3D printing methods when faced with prohibitive equipment costs, mechanical fragility, or structural damage to delicate substrates. These records come from graduate theses, 2021 to 2026, each labeled with its degree where the repository states it, and each links to its thesis. They were extracted by language models reading the full text, so treat each as a lead to read, not a verdict.

49
theses
18
institutions
51
failure records
7
failure modes

Plus 10 problems the authors left open, listed at the end.

Failure modes, by theses reporting them

Select a mode to jump to its records.

High cleanroom costs, slow throughput, and alignment complexity impede advanced lithography techniques
11
11 theses · 8 institutions · 11 records
Optical diffraction, proximity broadening, and improper exposure dose degrade microscale pattern resolution
10
10 theses · 7 institutions · 10 records
Resin entrapment, peel forces, and cytotoxic leaching hinder stereolithographic 3D printing of microfeatures
8
8 theses · 7 institutions · 8 records
Substrate non-planarity, film stress, and mask burial cause coating defects and lift-off failures
7
7 theses · 5 institutions · 7 records
Chemical solvents and resist processing induce degradation, contamination, and cracking in delicate polymers and 2D materials
6
6 theses · 4 institutions · 6 records
Crosslinking deficiencies and thermal instability cause mechanical failure and material leaching in photopolymerized scaffolds
5
5 theses · 4 institutions · 5 records
Physical machining and direct-write patterning generate surface roughness, microscale shorting, and structural artifacts
4
4 theses · 4 institutions · 4 records

High cleanroom costs, slow throughput, and alignment complexity impede advanced lithography techniques

11 theses · 8 institutions

Complex lithography techniques such as electron-beam writing, microstereolithography, and projection systems were often rejected due to slow processing speeds, extreme equipment costs, and alignment hurdles. Cleanroom photolithography and multi-objective setups also suffered from poor wafer-scale yield, mask inflexibility, and tedious realignment steps without providing practical benefits.

Tried and failed

maskless photolithography of thick photoresist applied to large-area microfluidic master mold fabrication. Reason: failed to faithfully reproduce fine features across large wafers, resulting in inaccurate feature spacing and fluid leakage

Multi-Niche Human Bone Marrow On-A-Chip for Studying the Interactions of Adoptive Cell Therapies with Multiple Myeloma · Georgia Tech · PhD

Tried and failed

multi-objective sequential two-photon polymerization lithography applied to multi-scale additive micro-manufacturing. Outcome: worse than baseline. Reason: tedious realignment between objectives yielded no observable benefit over a single lower-magnification objective

Additive Manufacturing of Electrical Machines and Electronic Devices · MIT · PhD

Considered and rejected

Considered and rejected: Rejected using electron beam lithography for patterning global alignment markers due to high cost and low throughput compared to photolithography.

Two-Dimensional Steep-Slope Transistors · University at Buffalo · PhD

Considered and rejected

Considered and rejected: Rejected standard cleanroom photolithography/wet etching for scalable sleep patch manufacturing due to high cost, low yield, and radial over-etching across wafers in favor of femtosecond laser micromachining.

Study Of Soft Materials, Nano-Microfabrication, And Flexible Packaging For Developing Wearable Flexible Hybrid Electronics · Georgia Tech · PhD

Considered and rejected

Considered and rejected: Rejected PDMS dome combined with chrome-on-glass photolithography base (from 2019 baseline) due to high cost, time-consuming fabrication, and poor 3D scalability.

PROOF OF CONCEPT FOR 3-D PRINTABLE GEOMETRY OF MICROFLUIDIC BENTHIC MICROBIAL FUEL CELL DEVICE (MBMFC) WITH SELF-ASSEMBLED WIRING · Naval Postgraduate School · Master's

Considered and rejected

Considered and rejected: Rejected top-down lithographic techniques (e-beam or polymer pen lithography) for substrate patterning due to high equipment cost, poor scalability, and substrate incompatibility.

Fabrications and Applications of  Protein-based Bionanocomposites · Virginia Tech · Doctorate

Considered and rejected

Considered and rejected: Microfluidic PDMS-glass chips with turbidity readout abandoned due to labor-intensive cleanroom fabrication, sealing issues, and unreliable visual turbidity.

Towards point-of-care molecular diagnostics for prenatal screening · Boston University · PhD

Considered and rejected

Considered and rejected: Rejected photolithographic clean-room MEMS fabrication due to mask inflexibility and low force generation at meso-scale.

Active origami platforms for human-robot interactions · EPFL · PhD

Considered and rejected

Considered and rejected: Microscope projection photolithography (MPP) was rejected for micropatterning coverslips due to its small exposure area (~10^4 µm^2), making large cm-scale culture areas too labor-intensive.

Single Cell Transcriptomics and Spatial Localization in Mouse Neurons · Penn · PhD

Considered and rejected

Considered and rejected: Rejected PDMS channel microfabrication with cleanroom lithography for the final multiplexed diagnostic device due to high manufacturing cost, complexity, and electrode deposition hurdles.

Engineering DNA-based electrochemical diagnostics for translational applications · MIT · PhD

Considered and rejected

Considered and rejected: Rejected two-step electron-beam lithography for large-area hybrid graphene-metal antidots due to alignment complexity, choosing single-step self-aligned photolithography with AZ5214E undercut

Advanced Nanophotonics Resonator Designs for High-Performance Surface-Enhanced Vibrational Spectroscopy Sensing Applications · University at Buffalo · PhD

Optical diffraction, proximity broadening, and improper exposure dose degrade microscale pattern resolution

10 theses · 7 institutions

Diffraction limits in optical and contact photolithography prevented the faithful replication of sub-micron and nanoscale patterns. In addition, incorrect exposure doses and proximity broadening caused pattern distortions, merging of adjacent features, and incomplete developer solubility.

Tried and failed

standard short UV exposure photolithography applied to photodegradable polymer micropatterning. Reason: insufficient photochemical degradation left polymer insoluble in aqueous developer

Single Cell Transcriptomics and Spatial Localization in Mouse Neurons · Penn · PhD

Tried and failed

contact aligner photolithography applied to sub-micron feature patterning. Reason: optical diffraction limits in contact printing prevented achieving sub-micron resolution

Simulation, Generation, and Detection of Low Emittance Electron Beams for Ultrafast Science · Cornell · PhD

Tried and failed

projection photolithography for direct metal photoreduction applied to arbitrary 2D metal micropatterning. Reason: reaction-diffusion of reactive species circularized sharp features and filled internal voids

Rapid and Affordable Nanoscale Printing via Projection of Superluminescent Light · Georgia Tech · PhD

Tried and failed

optical photolithography using positive photoresist applied to dense micron-scale line arrays. Reason: optical cross-talk and proximity effect broadening degraded resolution of densely spaced features

Continuous Antibody Titer Assessment of the Biomanufacturing Process using Nanofluidic Binding Assays · MIT · PhD

Tried and failed

low-dose electron-beam lithography applied to sub-micron optical waveguide couplers. Reason: underexposure caused distorted fine features, rough edges, and severe coupling transmission losses

Concentric Microresonators Design For Dispersion Engineering and Scalable Electron-Beam Lithography for Si and SiN Photonic Platforms · Texas Tech · PhD

Tried and failed

thick single-layer photoresist lithography applied to submicron channel patterning. Reason: narrow dose window led to underdevelopment at low exposure and feature rounding at high exposure

DECIPHERING BACTERIAL CELL ENVELOPE MECHANICS AND MECHANOSENSING: A MECHANICAL ENGINEERING APPROACH · Cornell · PhD

Tried and failed

dielectric nanopillar metasurface fabrication applied to optical linear polarizers. Reason: Feature oversizing during lithography caused adjacent nanopillars to merge, introducing unwanted optical phase retardance.

Metasurface-enhanced Multispectral and Polarization Filtering for SPAD imaging sensors · EPFL · PhD

Tried and failed

Hole-based photonic crystal polarization reflectors applied to optical state transfer fidelity. Reason: Extreme fabrication intolerance where nanometer-scale feature deviations cause severe fidelity loss

Techniques for Deployed Quantum Networks with Solid-State Defect Centers · MIT · PhD

Considered and rejected

Considered and rejected: Standard photolithography for contact patterning was rejected due to 2 μm resolution limit and unique flake geometries.

Transient Investigations of High-Field Conduction in Low-Dimensional Materials · University at Buffalo · PhD

Considered and rejected

Considered and rejected: Rejected traditional optical interference lithography for fine gratings below 300 nm due to wavelength diffraction limits, switching to E-beam lithography.

Techniques for Reducing Beam-Induced Damage in Electron Microscopy · MIT · PhD

Resin entrapment, peel forces, and cytotoxic leaching hinder stereolithographic 3D printing of microfeatures

8 theses · 7 institutions

Stereolithography frequently failed at microscale dimensions because unpolymerized liquid resin remained trapped inside negative features and separation peel forces tore fragile layers. Resins and photoinitiators also raised cytotoxicity concerns and leaching issues, while slow printing speeds and poor resolution limited mold utility.

Tried and failed

stereolithography 3D printing of negative microcavity features applied to micropatterned mold fabrication. Reason: uncured liquid resin remained trapped and clogged within microscale negative hole features during printing

Programming Complex Alignment in Engineered Cardiac Tissue · Harvard · PhD

Tried and failed

3D-printed and milled molds for soft lithography applied to microfluidic channel fabrication. Reason: Molds produced via stereolithography, FDM, and CNC milling failed to yield functional PDMS channels

Investigating the role of shear stress, von Willebrand factor, platelets and neutrophils in the initiation of venous thrombosis · Imperial · PhD

Tried and failed

stereolithography at extreme layer resolutions applied to fluidic manifolds. Reason: High resolution caused thread defects and excessive print time; low resolution lacked precision, causing leaks.

Extending human interaction capabilities with soft robotics · EPFL · PhD

Lost to a baseline

SLP negative-tone polymer printing rate is 35 times slower than commercial projection two-photon lithography (Saha et al., 2019)

Rapid and Affordable Nanoscale Printing via Projection of Superluminescent Light · Georgia Tech · PhD

Considered and rejected

Considered and rejected: Rejected stereolithography 3D printing due to restriction to photo-curable resins which limits scalability to common mass-produced substrates.

Design automation and rapid prototyping of multi-component droplet microfluidic platforms · Boston University · PhD

Tried and failed

stereolithography printing with low-modulus elastomeric resin applied to cellular lattice structures. Reason: vat adhesion peel forces during separation tore delicate low-stiffness layers apart during printing

Development and mechanical characterisation of additively manufactured lattice structures · Imperial · PhD

Considered and rejected

Considered and rejected: Rejected stereolithography (SLA) 3D printing in favor of FDM due to toxicity and leaching of unreacted photoinitiators/resins.

A Multifaceted Approach to Preserve Effective Antibiotics Utilizing Antibiotic Susceptibility Testing, Antimicrobial Coatings or Glycomimetic Adjuvants · Tübingen · PhD

Considered and rejected

Considered and rejected: Solvent-based extrusion and SLA stereolithography for PCL bioscaffolds were rejected due to altered mechanical rigidity, bridging limits, and potential cytotoxicity/crosslinker biocompatibility concerns.

Additive Manufacture of Parametrically Modulated Porous Scaffold Architectures for Medical Device Applications · University College Dublin · PhD

Substrate non-planarity, film stress, and mask burial cause coating defects and lift-off failures

7 theses · 5 institutions

Spin-coating photoresist across deep trenches or non-planar microdisks led to uneven pooling and severe loss of lithographic resolution. Thick material depositions and high film stresses further caused mask burial, film peeling, delamination during stripping, and resist bridge collapse.

Tried and failed

photolithography over deep pre-etched topographical trenches applied to heater electrode patterning on semiconductor chips. Reason: Photoresist pooled unevenly into trenches, degrading spin-coating uniformity and destroying photolithographic resolution

InGaAs/InP chip-based mid-infrared optical phased arrays for communications and sensing · UT Austin · PhD

Tried and failed

metal deposition on under-exposed negative photoresist applied to flexible thin-film electrode fabrication. Reason: sub-optimally exposed photoresist led to weak adhesion causing metal delamination during stripping

Organic electrochemical transistors for neurotechnology · Imperial · PhD

Tried and failed

deep ultraviolet lithography with negative photoresists applied to microstructure patterning. Outcome: unstable. Reason: optical incompatibility and high film stress causing poor substrate adhesion

Programmable Magnetics for Microscopic Assembly, Metamaterials, and Robots · Cornell · PhD

Considered and rejected

Considered and rejected: Lift-off process using photoresist spin-coating on patterned 50 µm SU-8 microdisks was rejected due to severe non-planarity and non-uniform resist coating; stencil lithography was used instead.

Laser-Induced Forward Transfer of Functional Microdevices · EPFL · PhD

Tried and failed

nanosphere lithography lift-off patterning applied to thick multilayer thin-film deposition. Reason: deposited material thickness buried etched mask spheres, preventing solvent access and lift-off removal

The development of scalable nanostructured renewable energy devices for smart window, solar cell, and water splitting applications · UT Austin · PhD

Tried and failed

multi-scale feature etching with uniform resist mask applied to photonic crystal cavity nanofabrication. Reason: Resist thickness could not clear small features without failing to protect large features during multi-step etching.

Diamond Nanostructures with Color Centers for Quantum Technology Experiments · Harvard · PhD

Tried and failed

low-voltage electron-beam lithography for high-aspect-ratio nanogaps applied to coupled nanophotonic waveguides. Outcome: unstable. Reason: resist bridges collapsed during development due to high aspect ratio and low beam energy

Enhanced infrared sensing with plasmonic metasurfaces and undetected light · Imperial · PhD

Chemical solvents and resist processing induce degradation, contamination, and cracking in delicate polymers and 2D materials

6 theses · 4 institutions

Standard photoresists and stripping solvents like acetone and PGMEA chemically attacked and cracked polymer substrates and ferroelectric films. Lithographic chemical processing also caused oxidation of sensitive two-dimensional flakes and left unwanted polymer residues that contaminated transducer surfaces.

Tried and failed

SEBS elastomeric substrate photolithography applied to sub-micron multilayer stretchable microelectronics. Reason: SEBS elastomer is incompatible with sub-micrometer multilayer photolithography processing

Bioelectronics for Cellular Electrophysiology during Tissue Development · Harvard · PhD

Tried and failed

standard electron-beam lithography with polymer resists applied to air-sensitive thin 2D material flakes. Outcome: unstable. Reason: causes chemical degradation and oxidation of thin flakes even when using dry solvents

Probing Quantum Geometric Phenomena in Antiferromagnetic Topological Insulators · Harvard · PhD

Considered and rejected

Considered and rejected: Rejected photolithography and e-beam lithography for semiconductor patterning due to solvent/chemical degradation and steep edge angles increasing contact resistance.

Analysis of the Contact Resistance of Organic Thin-Film Transistors · EPFL · PhD

Considered and rejected

Considered and rejected: Rejected conventional photolithography with PMMA photoresist in favor of shadow masking to prevent polymer residue contamination and p-type doping on 2D transducers.

Wide- and zero-bandgap nanodevices for extreme biosensing applications · Boston University · PhD

Considered and rejected

Considered and rejected: Rejected lift-off photolithography for patterning top gold electrodes on ferroelectric polymers because standard photoresist solvents (e.g., acetone) damage the polymer structure.

Ferroelectric and energy storage characterization of PVDF-based thin films and nanocomposites · TU Wien · PhD

Considered and rejected

Considered and rejected: Rejected photolithography lift-off on top of polymer thin films because resist solvent (PGMEA) and stripping solvents (acetone) chemically attack and crack the polymer.

Ferroelectric polymer thin films for MEMS applications : towards soft and high-speed AFM probes · TU Wien · PhD

Crosslinking deficiencies and thermal instability cause mechanical failure and material leaching in photopolymerized scaffolds

5 theses · 4 institutions

Scaffolds fabricated with low initiator or precursor concentrations suffered from insufficient crosslinking and were too mechanically fragile to withstand handling or fluid flow. Thermal leaching methods failed when sacrificial microgels did not dissolve at physiological temperatures, and unwashed matrices leached unreacted material into surrounding solution.

Tried and failed

fluid evacuation combined with bulk photopolymerization applied to granular hydrogel scaffold fabrication. Outcome: unstable. Reason: polymerized scaffold ruptured mechanically upon re-exposure to fluid flow

Data-driven approaches for complex systems: leveraging machine learning, materials science, and manufacturing for new biomedical technologies · MIT · PhD

Tried and failed

sacrificial microgel leaching for porous scaffold fabrication applied to photocrosslinkable hydrogel scaffolds. Reason: Sacrificial microgel beads failed to thermally dissolve at physiological temperature after photo-crosslinking.

Bioengineered scaffolds as a tool to decode the complexity of cancer cell interactions in vivo · Imperial · PhD

Tried and failed

photopolymerization with low precursor or initiator concentration applied to hydrogel fabrication. Reason: insufficient crosslinking led to hydrogels that were too mechanically weak to handle

POLYMERIZATION AND VOLUMETRIC PRINTING OF SOFT COMPOSITES · Cornell · PhD

Tried and failed

thermally induced phase separation scaffold fabrication applied to porous polyurethane tissue engineering scaffolds. Reason: phase separation caused macro-hole formation during freezing, impairing uniform cell seeding and adhesion

Towards personalised medicine - developing a 3D leukaemia biomimicry · Imperial · PhD

Tried and failed

drop-casting unwashed polyurethane polymer matrices applied to photocatalytic membrane fabrication. Outcome: unstable. Reason: unwashed pristine polymer matrices leach unreacted material into aqueous solution during irradiation cycles

Light-activated materials for singlet oxygen generation and the degradation of pollutants · University of Nevada, Reno · Master's

Physical machining and direct-write patterning generate surface roughness, microscale shorting, and structural artifacts

4 theses · 4 institutions

Laser direct-write and etching processes produced surface contamination, poor yields, and patterned shell artifacts compared to electron-beam tools. Mechanical milling and lithographic patterning defects also created surface roughness altering fluid shear stress and caused electrical shorting between closely spaced microgap electrodes.

Lost to a baseline

Visible meta-optics fabricated with laser direct-write (HiRes) exhibited lower resolution and patterned shell-like artifacts compared to electron beam lithography (JEOL JBX6300FS).

MEMS-integrated Alvarez Metalenses and Large-area Meta-optics · University of Washington · PhD

Considered and rejected

Considered and rejected: Rejected CNC milling of acrylic for microfluidic chip negative moulds due to ~0.1 µm surface roughness altering wall shear stress; switched to photolithography.

Platelet-inspired microparticles for targeted drug delivery to the atherosclerotic plaque · Imperial · PhD

Lost to a baseline

The 0.5 mm interference-lithography (IL) patterned scintillator exhibited worse spatial resolution (σ = 0.993 ± 0.029 mm) than the flat bare scintillator surface (σ = 0.396 ± 0.004 mm) due to nanofabrication disorder

Photonic Control of Incoherent Emission In and Out of Equilibrium · MIT · PhD

Tried and failed

Non-faradaic impedance spectroscopy on microgap interdigitated electrodes applied to bacterial cell detection. Outcome: unstable. Reason: High microfabrication shorting defects and unrepeatable impedance spectra at small interelectrode spacings

The impact of mass transport and surface charging on the performance of field effect transistor biosensors · Georgia Tech · PhD

Left open by the authors

Problems the authors named and did not get to.

Left open

Increase 3D printing resolution to fabricate thinner microfluidic channels and denser micropillar arrays for improved processing throughput. Blocker: Requires a physical wet lab, specialized high-resolution 3D printing hardware, and microfabrication materials.

Negative Enrichment of Circulating Tumor Cells Via 3D Printed Microfluidic Device · Georgia Tech · PhD

Left open

Investigate faster and cheaper deposition alternatives to ALD or alternative dielectrics like SiO2 for photonic crystal cavity filling. Blocker: Requires cleanroom fabrication facilities, wet lab chemistry, and thin-film deposition equipment.

High-performance metallo-dielectric photonic crystals: Design, fabrication, and testing of a practical emitter for portable thermophotovoltaic generators · MIT · PhD

Left open

Develop microfabricated small-scale well plates on microscope slides using two-photon polymerisation for single-FOV imaging with acoustic droplet dispensing. Blocker: Requires a physical microfabrication wet lab, two-photon polymerisation equipment, and acoustic droplet dispensers.

Parallel synthesis and screening of optical probes for G-quadruplex DNA · Imperial · PhD

Left open

Fabricate polymer interdigitated pillar electrostatic actuators scaled to micrometer dimensions using two-photon 3D printing or deep reactive-ion etching. Blocker: Requires cleanroom microfabrication equipment, two-photon 3D printers, or DRIE silicon etching apparatus

HIGH VOLTAGE PYROELECTRIC GENERATION, ELECTROSTATIC ACTUATORS, AND SENSING IN MICROSYSTEMS · Cornell · PhD

Left open

Design cost-effective integration of on-chip optical interconnects on PCBs to replace electrical traces. Blocker: Requires specialized hardware fabrication, optical engineering lab equipment, and physical prototyping facilities.

Physical Layer Data Integrity Attacks and Defenses in Cyber-Physical Systems · Virginia Tech · Doctorate

Left open

Replicate perovskite solar cell fabrication at larger scale using scalable techniques like inkjet printing, doctor blade printing, or slot-die coating. Blocker: Requires a wet-lab setup and physical deposition equipment (e.g., slot-die coater, inkjet printer).

Efficient planar formamidinium-based perovskite solar cells · Imperial · PhD

Left open

Develop glaucoma microshunt prototypes using alternative non-biodegradable gelatin copolymer materials and fabrication methods. Blocker: Requires a wet lab and specialized microfabrication equipment (e.g., projection micro-stereolithography) for polymer synthesis and prototype fabrication

A Novel Squid Glaucoma microShunt for Controlled Release of Aqueous Humor · UT Southwestern · Doctorate

Left open

Fabricate complex 3D microstructures using direct-write printing across alternative material systems beyond simple glasses. Blocker: Requires a physical high-temperature direct-write microfabrication apparatus and material synthesis lab.

MOLTEN-BASED 3-D DIRECTWRITE FABRICATION OF MICRO STRUCTURES · Georgia Tech · PhD

Left open

Design and fabricate nanoscale 3D-printed filters with parametric pores via two-photon lithography to maximize pathogen-SERS nanostructure apposition. Blocker: Requires advanced physical fabrication hardware (two-photon lithography system) and specialized materials/lab facilities.

Raman spectroscopy for point of care urinary tract infection diagnosis · Imperial · PhD

Left open

Optimize electrode geometry, impedance frequency, and polyaniline layer thickness for the printed root-monitoring sensors. Blocker: Requires wet lab fabrication facilities for screen printing and electrochemical sensor testing

Plant-on-a-chip: monitoring chemical responses in living plants with printed sensors · Imperial · PhD

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